Effect of deposition rate and substrate microstructure on gas sensitivity of Te thin films
Tellurium thin films have been prepared using different rates (0.1 ÷ 30 nm/s) by physical deposition in vacuum on glassy, sintered alumina and electrochemically nanostructured Al2O3 substrates. The sensitivity to nitrogen dioxide of fabricated films was tested at room temperature. It is shown that t...
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| Format: | Article |
| Language: | English |
| Published: |
Engineering Society for Corrosion, Belgrade
2019-12-01
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| Series: | Zaštita Materijala |
| Subjects: | |
| Online Access: | https://www.zastita-materijala.org/index.php/home/article/view/296 |
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