Effects of Electron Beam Lithography Process Parameters on the Structure of Nanoscale Devices Across Three Substrate Materials

Effects of Electron Beam Lithography Process Parameters on the Structure of Nanoscale Devices Across Three Substrate Materials

Electron beam lithography (EBL) is a pivotal technology in the fabrication of nanoscale devices, renowned for its high precision and resolution capabilities. This paper explores the effect of EBL process parameters on various substrate materials, including silicon dioxide, silicon-on-insulator (SOI)...

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Bibliographic Details
Main Authors: Zhongyang Liu, Yue Chen, Xuanyu Li, Luwei Wang, Junle Qu
Format: Article
Language:English
Published: MDPI AG 2025-03-01
Series:Photonics
Subjects:
electron beam lithography
nanoscale devices
semiconductor substrate
insulator substrate
Online Access:https://www.mdpi.com/2304-6732/12/3/226
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