Hwang, J., Kim, G., Joh, H., Ahn, J., & Jeon, S. The Effect of Ferroelectric/Dielectric Capacitance Ratio on Short-Term Retention Characteristics of MFMIS FeFET. IEEE.
Chicago Style (17th ed.) CitationHwang, Junghyeon, Giuk Kim, Hongrae Joh, Jinho Ahn, and Sanghun Jeon. The Effect of Ferroelectric/Dielectric Capacitance Ratio on Short-Term Retention Characteristics of MFMIS FeFET. IEEE.
MLA (9th ed.) CitationHwang, Junghyeon, et al. The Effect of Ferroelectric/Dielectric Capacitance Ratio on Short-Term Retention Characteristics of MFMIS FeFET. IEEE.
Warning: These citations may not always be 100% accurate.