Gas Nozzle Effect on the Deposition of Polysilicon by Monosilane Siemens Reactor
Deposition of polysilicon (poly-Si) was tried to increase productivity of poly-Si by using two different types of gas nozzle in a monosilane Bell-jar Siemens (MS-Siemens) reactor. In a mass production of poly-Si, deposition rate and energy consumption are very important factors because they are main...
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| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
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Wiley
2012-01-01
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| Series: | International Journal of Photoenergy |
| Online Access: | http://dx.doi.org/10.1155/2012/697653 |
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| author | Seung Oh Kang Uk June Lee Seung Hyun Kim Ho Jung You Kun Park Sung Eun Park Jong Hoon Park |
| author_facet | Seung Oh Kang Uk June Lee Seung Hyun Kim Ho Jung You Kun Park Sung Eun Park Jong Hoon Park |
| author_sort | Seung Oh Kang |
| collection | DOAJ |
| description | Deposition of polysilicon (poly-Si) was tried to increase productivity of poly-Si by using two different types of gas nozzle in a monosilane Bell-jar Siemens (MS-Siemens) reactor. In a mass production of poly-Si, deposition rate and energy consumption are very important factors because they are main performance indicators of Siemens reactor and they are directly related with the production cost of poly-Si. Type A and B nozzles were used for investigating gas nozzle effect on the deposition of poly-Si in a MS-Siemens reactor. Nozzle design was analyzed by computation cluid dynamics (CFD). Deposition rate and energy consumption of poly-Si were increased when the type B nozzle was used. The highest deposition rate was 1 mm/h, and the lowest energy consumption was 72 kWh⋅kg-1 in this study. |
| format | Article |
| id | doaj-art-099770fa0092408ca1180539e528a6c8 |
| institution | OA Journals |
| issn | 1110-662X 1687-529X |
| language | English |
| publishDate | 2012-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | International Journal of Photoenergy |
| spelling | doaj-art-099770fa0092408ca1180539e528a6c82025-08-20T02:03:16ZengWileyInternational Journal of Photoenergy1110-662X1687-529X2012-01-01201210.1155/2012/697653697653Gas Nozzle Effect on the Deposition of Polysilicon by Monosilane Siemens ReactorSeung Oh Kang0Uk June Lee1Seung Hyun Kim2Ho Jung You3Kun Park4Sung Eun Park5Jong Hoon Park6Technical R&D Center, Semi-Materials Co., Ltd., Youngcheon, Gyeongbuk 770-803, Republic of KoreaTechnical R&D Center, Semi-Materials Co., Ltd., Youngcheon, Gyeongbuk 770-803, Republic of KoreaTechnical R&D Center, Semi-Materials Co., Ltd., Youngcheon, Gyeongbuk 770-803, Republic of KoreaTechnical R&D Center, Semi-Materials Co., Ltd., Youngcheon, Gyeongbuk 770-803, Republic of KoreaTechnical R&D Center, Semi-Materials Co., Ltd., Youngcheon, Gyeongbuk 770-803, Republic of KoreaTechnical R&D Center, Semi-Materials Co., Ltd., Youngcheon, Gyeongbuk 770-803, Republic of KoreaTechnical R&D Center, Semi-Materials Co., Ltd., Youngcheon, Gyeongbuk 770-803, Republic of KoreaDeposition of polysilicon (poly-Si) was tried to increase productivity of poly-Si by using two different types of gas nozzle in a monosilane Bell-jar Siemens (MS-Siemens) reactor. In a mass production of poly-Si, deposition rate and energy consumption are very important factors because they are main performance indicators of Siemens reactor and they are directly related with the production cost of poly-Si. Type A and B nozzles were used for investigating gas nozzle effect on the deposition of poly-Si in a MS-Siemens reactor. Nozzle design was analyzed by computation cluid dynamics (CFD). Deposition rate and energy consumption of poly-Si were increased when the type B nozzle was used. The highest deposition rate was 1 mm/h, and the lowest energy consumption was 72 kWh⋅kg-1 in this study.http://dx.doi.org/10.1155/2012/697653 |
| spellingShingle | Seung Oh Kang Uk June Lee Seung Hyun Kim Ho Jung You Kun Park Sung Eun Park Jong Hoon Park Gas Nozzle Effect on the Deposition of Polysilicon by Monosilane Siemens Reactor International Journal of Photoenergy |
| title | Gas Nozzle Effect on the Deposition of Polysilicon by Monosilane Siemens Reactor |
| title_full | Gas Nozzle Effect on the Deposition of Polysilicon by Monosilane Siemens Reactor |
| title_fullStr | Gas Nozzle Effect on the Deposition of Polysilicon by Monosilane Siemens Reactor |
| title_full_unstemmed | Gas Nozzle Effect on the Deposition of Polysilicon by Monosilane Siemens Reactor |
| title_short | Gas Nozzle Effect on the Deposition of Polysilicon by Monosilane Siemens Reactor |
| title_sort | gas nozzle effect on the deposition of polysilicon by monosilane siemens reactor |
| url | http://dx.doi.org/10.1155/2012/697653 |
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