APA (7th ed.) Citation

Huang, C., Tsai, X., Tarntair, F., Singh, A. K., Hsu, S., Wuu, D., . . . Horng, R. Fabrication of vertical gallium oxide PN diodes using homoepitaxial growth by MOCVD and ion implantation technology. Elsevier.

Chicago Style (17th ed.) Citation

Huang, Chih-Yang, Xin-Ying Tsai, Fu-Gow Tarntair, Anoop Kumar Singh, Shao-Hui Hsu, Dong-Sing Wuu, Kenneth Järrendahl, Ching-Lien Hsiao, and Ray-Hua Horng. Fabrication of Vertical Gallium Oxide PN Diodes Using Homoepitaxial Growth by MOCVD and Ion Implantation Technology. Elsevier.

MLA (9th ed.) Citation

Huang, Chih-Yang, et al. Fabrication of Vertical Gallium Oxide PN Diodes Using Homoepitaxial Growth by MOCVD and Ion Implantation Technology. Elsevier.