The Influence of Thermal Annealing on the Chemical Composition, Nanomechanical, and Nanotribological Properties of Tantalum Thin Films

Tantalum metal and tantalum oxide thin films are commonly used in semiconductor devices, protective coatings, and biomedical implants. However, there is limited information on their nanotribological behavior and small-scale mechanical properties. This study characterized the chemical, mechanical, an...

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Main Authors: Debottam Datta, Ali Eskandari, Junaid Syed, Himanshu Rai, Nitya Nand Gosvami, Ting Y. Tsui
Format: Article
Language:English
Published: MDPI AG 2025-04-01
Series:Micromachines
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Online Access:https://www.mdpi.com/2072-666X/16/4/427
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author Debottam Datta
Ali Eskandari
Junaid Syed
Himanshu Rai
Nitya Nand Gosvami
Ting Y. Tsui
author_facet Debottam Datta
Ali Eskandari
Junaid Syed
Himanshu Rai
Nitya Nand Gosvami
Ting Y. Tsui
author_sort Debottam Datta
collection DOAJ
description Tantalum metal and tantalum oxide thin films are commonly used in semiconductor devices, protective coatings, and biomedical implants. However, there is limited information on their nanotribological behavior and small-scale mechanical properties. This study characterized the chemical, mechanical, and tribological properties of as-deposited and 400 °C annealed β-Ta thin films using nanoindentation and atomic force microscope (AFM)-based nanoscale friction and wear tests. X-ray photoelectron spectroscopy (XPS) results revealed that a thermally grown Ta oxide layer forms on the surface of Ta film after being annealed at 400 °C. The nanoindentation data indicated an increase in both the hardness and elastic modulus in the heat-treated sample compared to the as-deposited Ta film (13.1 ± 1.3 GPa vs. 12.0 ± 1.4 GPa for hardness) and (213.1 ± 12.7 GPa vs. 175.2 ± 12.3 GPa for elastic modulus). Our nanotribological results show that the friction increased and wear resistance decreased on the surface of the annealed sample compared to the as-deposited Ta film. This discrepancy may be caused by the oxidation of Ta on the film surface, which induces residual compressive stresses in the film and degrades its wear resistance. Our results highlight the influence of thermal annealing and oxidation on nanotribological behavior and small-scale mechanical properties of Ta thin films.
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spelling doaj-art-0466da5b857d4005ade992e56b004c9a2025-08-20T03:13:50ZengMDPI AGMicromachines2072-666X2025-04-0116442710.3390/mi16040427The Influence of Thermal Annealing on the Chemical Composition, Nanomechanical, and Nanotribological Properties of Tantalum Thin FilmsDebottam Datta0Ali Eskandari1Junaid Syed2Himanshu Rai3Nitya Nand Gosvami4Ting Y. Tsui5Department of Materials Science & Engineering, Indian Institute of Technology Delhi Hauz Khas, New Delhi 110016, IndiaDepartment of Chemical Engineering, University of Waterloo, 200 University Avenue West, Waterloo, ON N2L 3G1, CanadaDepartment of Materials Science & Engineering, Indian Institute of Technology Delhi Hauz Khas, New Delhi 110016, IndiaDepartment of Materials Science & Engineering, Indian Institute of Technology Delhi Hauz Khas, New Delhi 110016, IndiaDepartment of Materials Science & Engineering, Indian Institute of Technology Delhi Hauz Khas, New Delhi 110016, IndiaDepartment of Chemical Engineering, University of Waterloo, 200 University Avenue West, Waterloo, ON N2L 3G1, CanadaTantalum metal and tantalum oxide thin films are commonly used in semiconductor devices, protective coatings, and biomedical implants. However, there is limited information on their nanotribological behavior and small-scale mechanical properties. This study characterized the chemical, mechanical, and tribological properties of as-deposited and 400 °C annealed β-Ta thin films using nanoindentation and atomic force microscope (AFM)-based nanoscale friction and wear tests. X-ray photoelectron spectroscopy (XPS) results revealed that a thermally grown Ta oxide layer forms on the surface of Ta film after being annealed at 400 °C. The nanoindentation data indicated an increase in both the hardness and elastic modulus in the heat-treated sample compared to the as-deposited Ta film (13.1 ± 1.3 GPa vs. 12.0 ± 1.4 GPa for hardness) and (213.1 ± 12.7 GPa vs. 175.2 ± 12.3 GPa for elastic modulus). Our nanotribological results show that the friction increased and wear resistance decreased on the surface of the annealed sample compared to the as-deposited Ta film. This discrepancy may be caused by the oxidation of Ta on the film surface, which induces residual compressive stresses in the film and degrades its wear resistance. Our results highlight the influence of thermal annealing and oxidation on nanotribological behavior and small-scale mechanical properties of Ta thin films.https://www.mdpi.com/2072-666X/16/4/427tantalumnanotribologywearfrictionhardnesselastic modulus
spellingShingle Debottam Datta
Ali Eskandari
Junaid Syed
Himanshu Rai
Nitya Nand Gosvami
Ting Y. Tsui
The Influence of Thermal Annealing on the Chemical Composition, Nanomechanical, and Nanotribological Properties of Tantalum Thin Films
Micromachines
tantalum
nanotribology
wear
friction
hardness
elastic modulus
title The Influence of Thermal Annealing on the Chemical Composition, Nanomechanical, and Nanotribological Properties of Tantalum Thin Films
title_full The Influence of Thermal Annealing on the Chemical Composition, Nanomechanical, and Nanotribological Properties of Tantalum Thin Films
title_fullStr The Influence of Thermal Annealing on the Chemical Composition, Nanomechanical, and Nanotribological Properties of Tantalum Thin Films
title_full_unstemmed The Influence of Thermal Annealing on the Chemical Composition, Nanomechanical, and Nanotribological Properties of Tantalum Thin Films
title_short The Influence of Thermal Annealing on the Chemical Composition, Nanomechanical, and Nanotribological Properties of Tantalum Thin Films
title_sort influence of thermal annealing on the chemical composition nanomechanical and nanotribological properties of tantalum thin films
topic tantalum
nanotribology
wear
friction
hardness
elastic modulus
url https://www.mdpi.com/2072-666X/16/4/427
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