The Effect of Sputtering Parameters on the Film Properties of Molybdenum Back Contact for CIGS Solar Cells
Molybdenum (Mo) thin films are widely used as a back contact for CIGS-based solar cells. This paper determines the optimal settings for the sputtering parameters for an Mo thin film prepared on soda lime glass substrates, using direct current (dc) magnetron sputtering, with a metal Mo target, in an...
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| Format: | Article |
| Language: | English |
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Wiley
2013-01-01
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| Series: | International Journal of Photoenergy |
| Online Access: | http://dx.doi.org/10.1155/2013/390824 |
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| author | Peng-cheng Huang Chia-ho Huang Mao-yong Lin Chia-ying Chou Chun-yao Hsu Chin-guo Kuo |
| author_facet | Peng-cheng Huang Chia-ho Huang Mao-yong Lin Chia-ying Chou Chun-yao Hsu Chin-guo Kuo |
| author_sort | Peng-cheng Huang |
| collection | DOAJ |
| description | Molybdenum (Mo) thin films are widely used as a back contact for CIGS-based solar cells. This paper determines the optimal settings for the sputtering parameters for an Mo thin film prepared on soda lime glass substrates, using direct current (dc) magnetron sputtering, with a metal Mo target, in an argon gas environment. A Taguchi method with an L9 orthogonal array, the signal-to-noise ratio, and an analysis of variances is used to determine the performance characteristics of the coating operation. The main sputtering parameters, such as working pressure (mTorr), dc power (W), and substrate temperature (°C), are optimized with respect to the structural features, surface morphology, and electrical properties of the Mo films. An adhesive tape test is performed on each film to determine the adhesion strength of the films. The experimental results show that the working pressure has the dominant effect on electrical resistivity and reflectance. The intensity of the main peak (110) for the Mo film increases and the full width at half maximum decreases gradually as the sputtering power is increased. Additionally, the application of an Mo bilayer demonstrates good adherence and low resistivity. |
| format | Article |
| id | doaj-art-0326fb1d7d70444486f9de907bfd56dd |
| institution | DOAJ |
| issn | 1110-662X 1687-529X |
| language | English |
| publishDate | 2013-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | International Journal of Photoenergy |
| spelling | doaj-art-0326fb1d7d70444486f9de907bfd56dd2025-08-20T03:16:46ZengWileyInternational Journal of Photoenergy1110-662X1687-529X2013-01-01201310.1155/2013/390824390824The Effect of Sputtering Parameters on the Film Properties of Molybdenum Back Contact for CIGS Solar CellsPeng-cheng Huang0Chia-ho Huang1Mao-yong Lin2Chia-ying Chou3Chun-yao Hsu4Chin-guo Kuo5Department of Mechanical Engineering, Lunghwa University of Science and Technology, Taoyuan, TaiwanDepartment of Mechanical Engineering, Lunghwa University of Science and Technology, Taoyuan, TaiwanDepartment of Mechanical and Electrical Engineering, Fujian Polytechnic of Information Technology, Fujian, TaiwanDepartment of Mechanical Engineering, Lunghwa University of Science and Technology, Taoyuan, TaiwanDepartment of Mechanical Engineering, Lunghwa University of Science and Technology, Taoyuan, TaiwanDepartment of Industrial Education, National Taiwan Normal University, Taipei, TaiwanMolybdenum (Mo) thin films are widely used as a back contact for CIGS-based solar cells. This paper determines the optimal settings for the sputtering parameters for an Mo thin film prepared on soda lime glass substrates, using direct current (dc) magnetron sputtering, with a metal Mo target, in an argon gas environment. A Taguchi method with an L9 orthogonal array, the signal-to-noise ratio, and an analysis of variances is used to determine the performance characteristics of the coating operation. The main sputtering parameters, such as working pressure (mTorr), dc power (W), and substrate temperature (°C), are optimized with respect to the structural features, surface morphology, and electrical properties of the Mo films. An adhesive tape test is performed on each film to determine the adhesion strength of the films. The experimental results show that the working pressure has the dominant effect on electrical resistivity and reflectance. The intensity of the main peak (110) for the Mo film increases and the full width at half maximum decreases gradually as the sputtering power is increased. Additionally, the application of an Mo bilayer demonstrates good adherence and low resistivity.http://dx.doi.org/10.1155/2013/390824 |
| spellingShingle | Peng-cheng Huang Chia-ho Huang Mao-yong Lin Chia-ying Chou Chun-yao Hsu Chin-guo Kuo The Effect of Sputtering Parameters on the Film Properties of Molybdenum Back Contact for CIGS Solar Cells International Journal of Photoenergy |
| title | The Effect of Sputtering Parameters on the Film Properties of Molybdenum Back Contact for CIGS Solar Cells |
| title_full | The Effect of Sputtering Parameters on the Film Properties of Molybdenum Back Contact for CIGS Solar Cells |
| title_fullStr | The Effect of Sputtering Parameters on the Film Properties of Molybdenum Back Contact for CIGS Solar Cells |
| title_full_unstemmed | The Effect of Sputtering Parameters on the Film Properties of Molybdenum Back Contact for CIGS Solar Cells |
| title_short | The Effect of Sputtering Parameters on the Film Properties of Molybdenum Back Contact for CIGS Solar Cells |
| title_sort | effect of sputtering parameters on the film properties of molybdenum back contact for cigs solar cells |
| url | http://dx.doi.org/10.1155/2013/390824 |
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