Enhanced strength and electrical conductivity in pure copper via dynamic offsets and shear force adjustments cryorolling combining annealing

Asymmetric cryorolling demonstrates significant potential for producing materials with high strength and excellent electrical conductivity. This study presents an innovative Dynamic Offsets and Shear Force Adjustments Cryorolling (DSCR) technique coupled with short-time annealing (DSCRA), systematic...

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Main Authors: Longfei Xu, Renhao Wu, Shi Woo Lee, Xin Xue, Yan Peng, Yuhui Wang, Hyoung Seop Kim
Format: Article
Language:English
Published: Elsevier 2025-07-01
Series:Materials & Design
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Online Access:http://www.sciencedirect.com/science/article/pii/S0264127525006057
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author Longfei Xu
Renhao Wu
Shi Woo Lee
Xin Xue
Yan Peng
Yuhui Wang
Hyoung Seop Kim
author_facet Longfei Xu
Renhao Wu
Shi Woo Lee
Xin Xue
Yan Peng
Yuhui Wang
Hyoung Seop Kim
author_sort Longfei Xu
collection DOAJ
description Asymmetric cryorolling demonstrates significant potential for producing materials with high strength and excellent electrical conductivity. This study presents an innovative Dynamic Offsets and Shear Force Adjustments Cryorolling (DSCR) technique coupled with short-time annealing (DSCRA), systematically investigating its synergy in tailoring mechanical properties, microstructural, recrystallization behavior, and thermal stability of pure copper. Compared to conventional symmetric rolling (SR) followed by annealing (SRA), the DSCRA specimens exhibit 27.9% higher microhardness and 18.3% enhanced ultimate tensile strength under annealing at 180 °C for 15 min, primarily driven by optimized dislocation strengthening and grain boundary strengthening. Both SRA and DSCRA specimens achieve >95% IACS electrical conductivity at elevated annealing temperatures. Microstructural analysis reveals that DSCRA specimens generate weaker and more homogeneous texture prior to recrystallization, resulting in 31.3% higher grain growth activation energy and superior thermal stability. These findings establish DSCRA as an industrially scalable strategy for manufacturing high-performance copper plates, providing critical insights for designing deformation-annealing protocols for conductive structural materials.
format Article
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publishDate 2025-07-01
publisher Elsevier
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series Materials & Design
spelling doaj-art-019f6007ea3b448aab8ab17f2c06f3152025-08-20T02:10:06ZengElsevierMaterials & Design0264-12752025-07-0125511418510.1016/j.matdes.2025.114185Enhanced strength and electrical conductivity in pure copper via dynamic offsets and shear force adjustments cryorolling combining annealingLongfei Xu0Renhao Wu1Shi Woo Lee2Xin Xue3Yan Peng4Yuhui Wang5Hyoung Seop Kim6National Engineering Research Center for Equipment and Technology of Cold Strip Rolling, Yanshan University, Qinhuangdao 066004, China; Graduate Institute of Ferrous & Energy Materials Technology, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of KoreaGraduate Institute of Ferrous & Energy Materials Technology, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of KoreaDepartment of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of KoreaNational Engineering Research Center for Equipment and Technology of Cold Strip Rolling, Yanshan University, Qinhuangdao 066004, ChinaNational Engineering Research Center for Equipment and Technology of Cold Strip Rolling, Yanshan University, Qinhuangdao 066004, ChinaNational Engineering Research Center for Equipment and Technology of Cold Strip Rolling, Yanshan University, Qinhuangdao 066004, China; Corresponding author.Graduate Institute of Ferrous & Energy Materials Technology, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea; Institute for Convergence Research and Education in Advanced Technology, Yonsei University, Seoul 03722, Republic of Korea; Advanced Institute for Materials Research (WPI-AIMR), Tohoku University, Sendai 980-8577, Japan; Corresponding author at: Graduate Institute of Ferrous & Energy Materials Technology, Pohang University of Science and Technology (POSTECH), Pohang, 37673, Republic of Korea.Asymmetric cryorolling demonstrates significant potential for producing materials with high strength and excellent electrical conductivity. This study presents an innovative Dynamic Offsets and Shear Force Adjustments Cryorolling (DSCR) technique coupled with short-time annealing (DSCRA), systematically investigating its synergy in tailoring mechanical properties, microstructural, recrystallization behavior, and thermal stability of pure copper. Compared to conventional symmetric rolling (SR) followed by annealing (SRA), the DSCRA specimens exhibit 27.9% higher microhardness and 18.3% enhanced ultimate tensile strength under annealing at 180 °C for 15 min, primarily driven by optimized dislocation strengthening and grain boundary strengthening. Both SRA and DSCRA specimens achieve >95% IACS electrical conductivity at elevated annealing temperatures. Microstructural analysis reveals that DSCRA specimens generate weaker and more homogeneous texture prior to recrystallization, resulting in 31.3% higher grain growth activation energy and superior thermal stability. These findings establish DSCRA as an industrially scalable strategy for manufacturing high-performance copper plates, providing critical insights for designing deformation-annealing protocols for conductive structural materials.http://www.sciencedirect.com/science/article/pii/S0264127525006057Dynamic offsetsCryorollingPure copperMechanical propertiesElectrical conductivityThermal stability
spellingShingle Longfei Xu
Renhao Wu
Shi Woo Lee
Xin Xue
Yan Peng
Yuhui Wang
Hyoung Seop Kim
Enhanced strength and electrical conductivity in pure copper via dynamic offsets and shear force adjustments cryorolling combining annealing
Materials & Design
Dynamic offsets
Cryorolling
Pure copper
Mechanical properties
Electrical conductivity
Thermal stability
title Enhanced strength and electrical conductivity in pure copper via dynamic offsets and shear force adjustments cryorolling combining annealing
title_full Enhanced strength and electrical conductivity in pure copper via dynamic offsets and shear force adjustments cryorolling combining annealing
title_fullStr Enhanced strength and electrical conductivity in pure copper via dynamic offsets and shear force adjustments cryorolling combining annealing
title_full_unstemmed Enhanced strength and electrical conductivity in pure copper via dynamic offsets and shear force adjustments cryorolling combining annealing
title_short Enhanced strength and electrical conductivity in pure copper via dynamic offsets and shear force adjustments cryorolling combining annealing
title_sort enhanced strength and electrical conductivity in pure copper via dynamic offsets and shear force adjustments cryorolling combining annealing
topic Dynamic offsets
Cryorolling
Pure copper
Mechanical properties
Electrical conductivity
Thermal stability
url http://www.sciencedirect.com/science/article/pii/S0264127525006057
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