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    Corrigendum to “Understanding dose correction for high-resolution 50 kV electron-beam lithography on thick resist layers” [Micro and Nano Engineering Volume 16, August 2022, 100141]

    Corrigendum to “Understanding dose correction for high-resolution 50 kV electron-beam lithography on thick resist layers” [Micro and Nano Engineering Volume 16, August 2022, 100141... by Mattias Åstrand, Thomas Frisk, Hanna Ohlin, Ulrich Vogt

    Published 2025-03-01
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