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    Effect of Precursor Purge Time on Plasma-Enhanced Atomic Layer Deposition-Prepared Ferroelectric Hf0.5Zr0.5O2 Phase and Performance

    Effect of Precursor Purge Time on Plasma-Enhanced Atomic Layer Deposition-Prepared Ferroelectric Hf0.5Zr0.5O2 Phase and Performance by Yong Kyu Choi, Kristina Holsgrove, Andrea Watson, Benjamin L. Aronson, Megan K. Lenox, Liron Shvilberg, Chuanzhen Zhou, Shelby S. Fields, Shihao Wang, Stephen J. McDonnell, Amit Kumar, Jon F. Ihlefeld

    Published 2025-05-01
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