Monitoring the chemical and structural changes during progressive aqueous alteration of silica thin films deposited by CVD process : accurate thickness loss rates measurements by Farah Inoubli, Babacar Diallo, Konstantina Christina Topka, Raphael Laloo, Emmanuel Veron, Vincent Sarou-Kanian, Brigitte Caussat, Thierry Sauvage, Viviane Turq, Nadia Pellerin

Get full text