The Influence of Etching Method on the Occurrence of Defect Levels in III-V and II-VI Materials by Kinga Majkowycz, Krzysztof Murawski, Małgorzata Kopytko, Krzesimir Nowakowski-Szkudlarek, Marta Witkowska-Baran, Piotr Martyniuk

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NbN-based Josephson junctions grown by plasma-assisted molecular beam epitaxy by Artur Lachowski, Paweł Wolny, Krzysztof Dybko, Mikołaj Chlipała, Krzesimir Nowakowski-Szkudlarek, Mateusz Hajdel, Mikołaj Żak, Anna Feduniewicz, Marta Sawicka, Witold Chromiński, Ewa Grzanka, Czesław Skierbiszewski

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