Non-contact and nanometer-scale measurement of PN junction depth buried in Si wafers using terahertz emission spectroscopy by Fumikazu Murakami, Shinji Ueyama, Kenji Suzuki, Ingi Kim, Inkeun Baek, Sangwoo Bae, Dougyong Sung, Myungjun Lee, Sungyoon Ryu, Yusin Yang, Masayoshi Tonouchi

Get full text