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    An Improved Algorithm to Extract Moiré Fringe Phase for Wafer-Mask Alignment in Nanoimprint Lithography

    An Improved Algorithm to Extract Moiré Fringe Phase for Wafer-Mask Alignment in Nanoimprint Lithography by Feifan Xu, Yinye Ding, Wenhao Chen, Haojie Xia

    Published 2024-11-01
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