Correction to “Evaluation of H2 Plasma‐Induced Damage in Materials for EUV Lithography” - Eun‐Seok Choe; Seungwook Choi; Ansoon Kim; Kwan‐Yong Kim; Hee‐Jung Yeom; Min Young Yoon; Seongwan Hong; Dong‐Wook Kim; Jung‐Hyung Kim; Hyo‐Chang Lee (Advanced Materials Interfaces)