A 200 mm Wafer-Scale Al<sub>2</sub>O<sub>3</sub> Photonics Waveguide Technology for UV and Visible Applications
Low-loss, UV wavelength compatible Al<sub>2</sub>O<sub>3</sub> photonic waveguides have been fabricated in a 200 mm CMOS pilot line. The Al<sub>2</sub>O<sub>3</sub> waveguide layer optical properties and roughness were characterized by ellipsometry and...
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| Main Authors: | , , , , , , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IEEE
2025-01-01
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| Series: | IEEE Photonics Journal |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/10993371/ |
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| Summary: | Low-loss, UV wavelength compatible Al<sub>2</sub>O<sub>3</sub> photonic waveguides have been fabricated in a 200 mm CMOS pilot line. The Al<sub>2</sub>O<sub>3</sub> waveguide layer optical properties and roughness were characterized by ellipsometry and AFM, respectively. Optical losses of the slab mode in the waveguide layer were studied by prism coupling. SiO<sub>2</sub>-cladded Al<sub>2</sub>O<sub>3</sub> waveguides were patterned on 200 mm wafers and propagation losses were measured at 266, 360, 450, 532 and 638 nm wavelengths. Wafer-level measurements for 360–638 nm show an average propagation loss below 0.6 dB/cm, while die-level measurements for 266 nm yield average propagation losses between 4.3 and 14.7 dB/cm. To study the dependence of the wave propagation on processing variations, large sets of Mach-Zehnder interferometers with varying arm lengths were measured at a wavelength of 360 nm, and the coherence length of the standard 450 nm wide and 110 nm high Al<sub>2</sub>O<sub>3</sub> waveguide was calculated to be longer than 2.2 mm. |
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| ISSN: | 1943-0655 |